不同方法沉积Ta2O5-SiO2多层膜激光损伤阈值及光学特性的比较研究

R. Botha, Silvia Schwyn Thöny, M. Größl, S. Mourad, C. Maissen, J. I. Venter, T. Südmeyer, M. Hoffmann, P. Bulkin, Sabine Linz-Dittrich, D. Bischof, M. Michler, S. Rinner, A. Ettemeyer
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引用次数: 2

摘要

来自私人和学术部门的制造工艺被用于沉积由Ta2O5 - SiO2多层组成的抗反射和高反射涂层。所使用的沉积技术包括三个离子辅助沉积系统和一个离子束溅射系统。涂层是在由两个不同供应商抛光的熔融二氧化硅(康宁7980)基材上进行的。LIDT测量使用调q Nd:YAG激光器,工作波长为1064nm。本文从激光损伤阈值、光学性能和表面质量等方面对两种涂层进行了比较。
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Comparative study of the laser damage threshold and optical characteristics of Ta2O5-SiO2 multilayers deposited using various methods
Manufacturing processes from the private and academic sectors were used to deposit anti-reflective and high-reflective coatings composed of Ta2O5 - SiO2 multilayers. Used deposition techniques included three Ion Assisted Deposition (IAD) systems and an Ion Beam Sputtering (IBS) system. Coatings were performed on fused silica (Corning 7980) substrates polished by two different suppliers. LIDT Measurements were performed using a Q-Switched Nd:YAG laser operating at 1064nm. The paper presents a comparison of the coatings in terms of laser damage threshold values, optical properties and surface quality.
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