a-sio2中低频激发的中子散射

U. Buchenau
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引用次数: 0

摘要

在50 ~ 300 K至150 GHz频率范围内,研究了玻璃质二氧化硅非弹性中子散射强度与温度的关系。在500 GHz以上,我们发现本质上是谐波行为。低频下的非调和行为可以用松弛模型描述,使用由力学测量确定的参数。从其动态结构因子来看,弛豫是SiO4四面体的耦合旋转跳变。这些弛豫中原子的跳变宽度小于0.8 Å。结果支持低温玻璃异常有共同起源的假设。
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Neutron scattering from low-frequency excitations in a-sio2
The temperature dependence of the inelastic neutron scattering intensity from vitreous silica has been studied between 50 and 300 K down to frequencies of 150 GHz. Above 500 GHz one finds essentially harmonic behaviour. The anharmonic behaviour at low frequencies can be described in a relaxational model using parameters determined from mechanical measurements. From their dynamic structure factor, the relaxations are coupled rotational jumps of SiO4 tetrahedra. The jump width of the atoms in these relaxations is shown to be smaller than 0.8 Å. The results support the hypothesis of a common origin of the low temperatures glass anomalies.
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