亚30nm nmosfet的低温工作:器件结构的影响

G. Bertrand, S. Deleonibus, D. Souil, B. Previtali, C. Caillat, G. Guégan, M. Sanquer, F. Balestra
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引用次数: 0

摘要

在300K ~ 20K的温度范围内,分析了亚30nm nmosfet的载流子输运特性。在导态状态下,短通道晶体管低场迁移率的退化限制了速度超调和弹道输运的发生。然而,由于亚阈值摆动的急剧减少,观察到离子/ off权衡的大幅改善。因此,低温操作允许晶体管更接近其极限。在线性条件下(Vd<10mV),短沟道晶体管的Id-Vg特性振荡保持在75K以内。这些振荡应该是由状态辅助隧道电流引起的。
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Cryogenic operation of sub-30 nm nMOSFETs: impact of device architecture
Characteristics of carrier transport are analyzed on sub 30nm NMOSFETs at temperature ranging from 300K to 20K. In the on-state regime, degradation of the low field mobility on short channel transistors limits velocity overshoot and ballistic transport occurrence. Nevertheless, due to the drastic reduction of the subthreshold swing, large improvement of the Ion/Ioff trade-off is observed. Thus low temperature operation allows transistors to operate closer to their limit. In the linear regime (Vd<10mV), short channel transistors exhibits oscillations on the Id-Vg characteristics that remain up to 75K. These oscillations should be due to state assisted tunneling current.
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