反应性脉冲激光沉积的新研究

ROMOPTO International Conference on Micro- to Nano- Photonics III Pub Date : 1998-07-02 DOI:10.1117/12.312749

I. Mihăilescu, E. Gyorgy, V. Teodorescu, G. Marin, D. Pantelica, A. Andrei, J. Neamțu

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摘要

本文报道了反应性脉冲激光沉积TiC薄膜的合成和沉积。钛靶在低压CH4条件下接受了多脉冲紫外激光的作用。薄膜生长在与靶平行放置的收集器上。利用电子显微镜、电子能谱和核技术对薄膜进行了表征。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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New studies of reactive pulsed laser deposition

We report the synthesis and deposition of TiC films by reactive pulsed laser deposition. Ti targets have been submitted to multipulse UV laser action in low pressure CH4. The thin films were grown on a collector placed parallel to the target. The films were characterized by electron microscopy, electron spectroscopy and nuclear techniques.

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ROMOPTO International Conference on Micro- to Nano- Photonics III

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