一种基于系统级封装的新型射频应用TSV中介器

Rongfeng Luo, Y. Chai, Shengli Ma, Xiaoyuzhang, Feng Ji, Qi Zhong
{"title":"一种基于系统级封装的新型射频应用TSV中介器","authors":"Rongfeng Luo, Y. Chai, Shengli Ma, Xiaoyuzhang, Feng Ji, Qi Zhong","doi":"10.1109/ESTC.2018.8546492","DOIUrl":null,"url":null,"abstract":"In this paper, a TSV interposer base SIP for RF applications is proposed. It’s composed of two separate TSV interposers based on high resistivity Si substrate, which is utilized as the substrate and Cap for RF SIP package. Choice of high resistivity Si substrate is intended to relieve RF loss. The one used for SIP package substrate is consisted of Cu TSVs, RF transmission lines and cavities, the cavity is coated with Copper layer inside, populated with electrical grounding Cu TSVs at the bottom surface, surrounded by lines of TSVs, and it’s utilized to accommodate RF microelectronic chips. The other one used for capping is similar to the bottom TSV interposer in structure. The two TSV interposers will be aligned in the final step with the cavities being sealed to form a close room for the inside RF device for improving the property in electromagnetic compatibility. To demonstrate TSV interposer based RF SIP, Process is developed for the TSV interposer. To testify theprocess, a test vehicle is designed and TSV interposer is fabricated, assembled and characterized.","PeriodicalId":198238,"journal":{"name":"2018 7th Electronic System-Integration Technology Conference (ESTC)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A novel TSV interposer based System-in-Package for RF applications\",\"authors\":\"Rongfeng Luo, Y. Chai, Shengli Ma, Xiaoyuzhang, Feng Ji, Qi Zhong\",\"doi\":\"10.1109/ESTC.2018.8546492\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a TSV interposer base SIP for RF applications is proposed. It’s composed of two separate TSV interposers based on high resistivity Si substrate, which is utilized as the substrate and Cap for RF SIP package. Choice of high resistivity Si substrate is intended to relieve RF loss. The one used for SIP package substrate is consisted of Cu TSVs, RF transmission lines and cavities, the cavity is coated with Copper layer inside, populated with electrical grounding Cu TSVs at the bottom surface, surrounded by lines of TSVs, and it’s utilized to accommodate RF microelectronic chips. The other one used for capping is similar to the bottom TSV interposer in structure. The two TSV interposers will be aligned in the final step with the cavities being sealed to form a close room for the inside RF device for improving the property in electromagnetic compatibility. To demonstrate TSV interposer based RF SIP, Process is developed for the TSV interposer. To testify theprocess, a test vehicle is designed and TSV interposer is fabricated, assembled and characterized.\",\"PeriodicalId\":198238,\"journal\":{\"name\":\"2018 7th Electronic System-Integration Technology Conference (ESTC)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 7th Electronic System-Integration Technology Conference (ESTC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESTC.2018.8546492\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 7th Electronic System-Integration Technology Conference (ESTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESTC.2018.8546492","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

本文提出了一种用于射频应用的基于TSV中继器的SIP。它由两个独立的基于高电阻率Si衬底的TSV介面组成,用作射频SIP封装的衬底和封盖。选择高电阻率的Si衬底是为了减轻射频损耗。SIP封装基板由Cu tsv、RF传输线和空腔组成,空腔内部镀有铜层,底面填充电接地Cu tsv,周围为tsv线,用于容纳RF微电子芯片。另一种用于封盖,其结构类似于底部TSV中间体。在最后一步中,将两个TSV介面对齐,并密封腔体,为内部射频器件形成一个封闭的房间,以提高电磁兼容性。为了演示基于TSV中介器的射频SIP,开发了TSV中介器的流程。为了验证这一过程,设计了一辆试验车,并对TSV中介器进行了制造、组装和表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
A novel TSV interposer based System-in-Package for RF applications
In this paper, a TSV interposer base SIP for RF applications is proposed. It’s composed of two separate TSV interposers based on high resistivity Si substrate, which is utilized as the substrate and Cap for RF SIP package. Choice of high resistivity Si substrate is intended to relieve RF loss. The one used for SIP package substrate is consisted of Cu TSVs, RF transmission lines and cavities, the cavity is coated with Copper layer inside, populated with electrical grounding Cu TSVs at the bottom surface, surrounded by lines of TSVs, and it’s utilized to accommodate RF microelectronic chips. The other one used for capping is similar to the bottom TSV interposer in structure. The two TSV interposers will be aligned in the final step with the cavities being sealed to form a close room for the inside RF device for improving the property in electromagnetic compatibility. To demonstrate TSV interposer based RF SIP, Process is developed for the TSV interposer. To testify theprocess, a test vehicle is designed and TSV interposer is fabricated, assembled and characterized.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Wafer Level Through Polymer Optical Vias (TPOV) Enabling High Throughput of Optical Windows Manufacturing ESTC 2018 TOC Calculation of local solder temperature profiles in reflow ovens Numerical and statistical investigation of weld formation in a novel two-dimensional copper-copper bonding process Nonconchoidal Fracture in Power Electronics Substrates due to Delamination in Baseplate Solder Joints
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1