{"title":"MEMS传声器用硅基铂膜的制备","authors":"A. A. Hamzah, B. Y. Majlis, I. Ahmad","doi":"10.1109/SMELEC.2006.381010","DOIUrl":null,"url":null,"abstract":"Platinum membrane with silicon nitride layer is fabricated and analyzed. The membrane, which is designed for MEMS microphone application, is fabricated using sputter platinum and CVD silicon nitride. Membranes with sandwich layer of platinum-nitride-platinum with thickness of 6.35 mum are successfully fabricated. Deflection of the fabricated membrane corresponding to given pressure is measured using Tencor surface profiler. It is observed that deflection at its center is proportional to applied pressure for pressure between 20 Pa to 200 Pa. Average center deflection for applied pressure of 200 Pa is measured to be 0.41 mum. The fabricated platinum membrane is deemed suitable for MEMS microphone application due to its linear deflection response in acoustic pressure range.","PeriodicalId":136703,"journal":{"name":"2006 IEEE International Conference on Semiconductor Electronics","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Fabrication of Platinum Membrane on Silicon for MEMS Microphone\",\"authors\":\"A. A. Hamzah, B. Y. Majlis, I. Ahmad\",\"doi\":\"10.1109/SMELEC.2006.381010\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Platinum membrane with silicon nitride layer is fabricated and analyzed. The membrane, which is designed for MEMS microphone application, is fabricated using sputter platinum and CVD silicon nitride. Membranes with sandwich layer of platinum-nitride-platinum with thickness of 6.35 mum are successfully fabricated. Deflection of the fabricated membrane corresponding to given pressure is measured using Tencor surface profiler. It is observed that deflection at its center is proportional to applied pressure for pressure between 20 Pa to 200 Pa. Average center deflection for applied pressure of 200 Pa is measured to be 0.41 mum. The fabricated platinum membrane is deemed suitable for MEMS microphone application due to its linear deflection response in acoustic pressure range.\",\"PeriodicalId\":136703,\"journal\":{\"name\":\"2006 IEEE International Conference on Semiconductor Electronics\",\"volume\":\"58 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 IEEE International Conference on Semiconductor Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMELEC.2006.381010\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Conference on Semiconductor Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2006.381010","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication of Platinum Membrane on Silicon for MEMS Microphone
Platinum membrane with silicon nitride layer is fabricated and analyzed. The membrane, which is designed for MEMS microphone application, is fabricated using sputter platinum and CVD silicon nitride. Membranes with sandwich layer of platinum-nitride-platinum with thickness of 6.35 mum are successfully fabricated. Deflection of the fabricated membrane corresponding to given pressure is measured using Tencor surface profiler. It is observed that deflection at its center is proportional to applied pressure for pressure between 20 Pa to 200 Pa. Average center deflection for applied pressure of 200 Pa is measured to be 0.41 mum. The fabricated platinum membrane is deemed suitable for MEMS microphone application due to its linear deflection response in acoustic pressure range.