TiO2/SiO2多层涂层中的损耗

Jiří Budasz, J. Hutka, J. Václavík
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引用次数: 0

摘要

本文研究了由离子束辅助沉积(IBAD)蒸发的二氧化钛(TiO2)和二氧化硅(SiO2)层组成的涂层的光学损耗。这种组合通常用于光学涂层,作为可见光和近红外范围内抗反射或任何其他光学滤光片的标准选择。虽然这项技术已经问世几十年了,但我们指出,一些未被描述的寄生虫损失仍然可能出现,我们展示了如何处理它们。事实上,在某些情况下,损耗使目标涂层甚至不适用。在本文中,我们试图研究损耗的来源,并描述了使我们能够减少或完全消除损耗的沉积参数。我们确定损耗是与涂层的总厚度成正比还是与层数成正比。同时还测量了散射的影响。研究了沉积参数为衬底温度、辅助离子枪放电电压、辅助离子枪氧流量和沉积速率,特别是沉积速率的起始曲线。研究了后处理退火的影响。发现SiO2层沉积速率的起始曲线和辅助离子枪的氧气流量是关键参数。
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Losses in TiO2/SiO2 multilayer coatings
This paper deals with optical losses in the coatings consisting of a combination of titanium dioxide (TiO2) and silicon dioxide (SiO2) layers evaporated by the ion beam assisted deposition (IBAD). This combination is commonly used for optical coatings as a standard choice for antireflective or any other optical filter in the visible and near IR range. Although the technology has been known for decades, we point out that some undescribed parasite losses can still appear and we show how to deal with them. In fact, in some cases, the losses made the target coating even inapplicable. In this paper we try to investigate the origin of the losses and we describe the deposition parameters which allow us to reduce or completely remove them. We determined whether the losses are proportional to the total thickness of the coating or to the number of layers. The influence of scattering was measured as well. Deposition parameters which were studied are the substrate temperature, discharge voltage of the assisting ion gun, oxygen flow of the assisting ion gun and the deposition rate, especially its starting curve. Influence of the post process annealing was studied as well. Starting curve of the deposition rate of SiO2 layer and the amount of oxygen flowing through the assisting ion gun were found as a crucial parameters.
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