W. Kim, M. BrightSky, T. Masuda, N. Sosa, S. Kim, R. Bruce, F. Carta, G. Fraczak, H. Cheng, A. Ray, Y. Zhu, H. Lung, K. Suu, C. Lam
{"title":"带金属衬套的基于ald的受限PCM实现了无限耐久性","authors":"W. Kim, M. BrightSky, T. Masuda, N. Sosa, S. Kim, R. Bruce, F. Carta, G. Fraczak, H. Cheng, A. Ray, Y. Zhu, H. Lung, K. Suu, C. Lam","doi":"10.1109/IEDM.2016.7838343","DOIUrl":null,"url":null,"abstract":"We present for the first time in-depth analysis of the outstanding endurance characteristics of an ALD-based confined phase change memory (PCM) [1] with a thin metallic liner. Experimental results confirm that both the proper metallic liner and the confined pore cell structure are required for a reliability advantage. This confined PCM with a metallic liner is found to be immune to classic endurance failure mechanisms. The void-free confined PCM yields a new record endurance (2×1012 cycles) with stabilized elemental segregation that does not result in stuck-SET failure.","PeriodicalId":186544,"journal":{"name":"2016 IEEE International Electron Devices Meeting (IEDM)","volume":"238 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"57","resultStr":"{\"title\":\"ALD-based confined PCM with a metallic liner toward unlimited endurance\",\"authors\":\"W. Kim, M. BrightSky, T. Masuda, N. Sosa, S. Kim, R. Bruce, F. Carta, G. Fraczak, H. Cheng, A. Ray, Y. Zhu, H. Lung, K. Suu, C. Lam\",\"doi\":\"10.1109/IEDM.2016.7838343\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present for the first time in-depth analysis of the outstanding endurance characteristics of an ALD-based confined phase change memory (PCM) [1] with a thin metallic liner. Experimental results confirm that both the proper metallic liner and the confined pore cell structure are required for a reliability advantage. This confined PCM with a metallic liner is found to be immune to classic endurance failure mechanisms. The void-free confined PCM yields a new record endurance (2×1012 cycles) with stabilized elemental segregation that does not result in stuck-SET failure.\",\"PeriodicalId\":186544,\"journal\":{\"name\":\"2016 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"238 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"57\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2016.7838343\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2016.7838343","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
ALD-based confined PCM with a metallic liner toward unlimited endurance
We present for the first time in-depth analysis of the outstanding endurance characteristics of an ALD-based confined phase change memory (PCM) [1] with a thin metallic liner. Experimental results confirm that both the proper metallic liner and the confined pore cell structure are required for a reliability advantage. This confined PCM with a metallic liner is found to be immune to classic endurance failure mechanisms. The void-free confined PCM yields a new record endurance (2×1012 cycles) with stabilized elemental segregation that does not result in stuck-SET failure.