漏极扩展FinFET的分析与紧凑建模

Vikash Kumar, Chetan Kumar Dabhi, Shivendra Singh Parihar, Y. Chauhan
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引用次数: 2

摘要

本文给出了用于大功率应用的漏极扩展FinFET的综合仿真和紧凑模型。采用3-D技术计算机辅助设计(TCAD)模拟和分析了具有不同漏极扩展设计的功率FinFET(即(i)多翅片漏极扩展FinFET (ii)平面漏极扩展FinFET)。采用工业标准BSIM-CMG模型对TCAD校准的内频FinFET进行建模。为了模拟漏极扩展引起的准饱和效应,采用了电流相关电阻模型和BSIM-CMG模型。该模型经TCAD仿真验证,可用于大功率电路的仿真。
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Analysis and Compact Modeling of Drain-Extended FinFET
In this article, a comprehensive simulation and the compact model of drain extended FinFET for high power application is presented. Power FinFETs with different drain-extension designs (i.e. (i) multi-fin drain extended FinFET (ii) planar drain-extended FinFET) are simulated and analysed using 3-D Technology Computer-Aided Design (TCAD) simulation. TCAD calibrated intrinsic FinFET is modeled by the industry standard BSIM-CMG model. To model the effect of quasi-saturation due to drain-extension, current dependent resistance model is used along with BSIM-CMG model. The model is validated with TCAD simulations and, can be used for high power circuit simulations.
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