mo包覆Si场发射极阵列的场发射特性及硅化钼的形成

B. Ju, H. Park, Yun‐Hi Lee, I. Chung, M.R. Haskard, Juag-Ho Park, M. Oh
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引用次数: 0

摘要

采用反应离子刻蚀法和再氧化锐化法制备了均匀、可重复的硅尖阵列。在部分硅尖阵列上涂覆钼。在高真空水平下测试了电流-电压特性和电流波动。未涂覆针尖的导通电压为35 V,最大电流为1 mA,涂覆针尖的导通电压为15 V,最大电流为6 mA。未涂覆的硅尖端在运行13分钟后就被破坏,发射电流迅速降低,而涂覆的硅尖端则表现出稳定的发射特性。得到的电流通过Fowler-Nordheim图研究证明是场发射电流。
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Field emission properties of Mo-coated Si field emitter arrays and formation of molybdenum silicide
Uniform and reproducible silicon tip arrays were fabricated using the reactive ion etching followed by the re-oxidation sharpening. Molybdenum was coated on the some of the silicon tip array. Current-voltage characteristics and current fluctuations were tested in the high vacuum level. Turn-on voltage of the uncoated tip was 35 V and maximum current was 1 mA, while turn-on voltage of the coated tip was 15 V and maximum current was 6 mA. While uncoated silicon tip was destroyed after 13 minutes after operation and showed rapid lowering of emission current, coated tip showed stable emission characteristics. Obtained currents were proved to be field emission currents using the Fowler-Nordheim plot studies.
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