R. Salmio, J. Saarinen, H. Saarikoski, J. Turunen, A. Tervonen
{"title":"玻璃中的离子交换用于制造连续相位衍射光学元件","authors":"R. Salmio, J. Saarinen, H. Saarikoski, J. Turunen, A. Tervonen","doi":"10.1364/domo.1996.dmb.5","DOIUrl":null,"url":null,"abstract":"Diffractive phase elements, which only modulate the phase of an incident wavefront, provide high diffraction efficiencies. Such elements can be fabricated in the form of surface-relief profiles by a variety of methods including selective etching or material deposition, and diamond turning. Binary surface-relief elements have diffraction efficiencies of the order of 30–75% depending on the symmetries of the signal, while efficiencies even in excess of 90% are only possible if one employs continuous surface profiles fabricated, e.g., by direct-write laser beam or electron-beam lithography. Then, however, accurate exposure control is needed. Continuous surface profiles can be approximated by multilevel profiles, which may be fabricated by successive lithography steps, where careful mask alignment is then required.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"53 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Ion Exchange in Glass for the Fabrication of Continuous-Phase Diffractive Optical Elements\",\"authors\":\"R. Salmio, J. Saarinen, H. Saarikoski, J. Turunen, A. Tervonen\",\"doi\":\"10.1364/domo.1996.dmb.5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Diffractive phase elements, which only modulate the phase of an incident wavefront, provide high diffraction efficiencies. Such elements can be fabricated in the form of surface-relief profiles by a variety of methods including selective etching or material deposition, and diamond turning. Binary surface-relief elements have diffraction efficiencies of the order of 30–75% depending on the symmetries of the signal, while efficiencies even in excess of 90% are only possible if one employs continuous surface profiles fabricated, e.g., by direct-write laser beam or electron-beam lithography. Then, however, accurate exposure control is needed. Continuous surface profiles can be approximated by multilevel profiles, which may be fabricated by successive lithography steps, where careful mask alignment is then required.\",\"PeriodicalId\":301804,\"journal\":{\"name\":\"Diffractive Optics and Micro-Optics\",\"volume\":\"53 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Diffractive Optics and Micro-Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/domo.1996.dmb.5\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Diffractive Optics and Micro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/domo.1996.dmb.5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ion Exchange in Glass for the Fabrication of Continuous-Phase Diffractive Optical Elements
Diffractive phase elements, which only modulate the phase of an incident wavefront, provide high diffraction efficiencies. Such elements can be fabricated in the form of surface-relief profiles by a variety of methods including selective etching or material deposition, and diamond turning. Binary surface-relief elements have diffraction efficiencies of the order of 30–75% depending on the symmetries of the signal, while efficiencies even in excess of 90% are only possible if one employs continuous surface profiles fabricated, e.g., by direct-write laser beam or electron-beam lithography. Then, however, accurate exposure control is needed. Continuous surface profiles can be approximated by multilevel profiles, which may be fabricated by successive lithography steps, where careful mask alignment is then required.