B. Dang, D. Shih, Stephen Buchwalter, Cornelia Tsang, Chirag S. Patel, J. Knickerbocker, P. Gruber, Sarah Knickerbocker, J. Garant, Krystyna Semkow, K. Ruhmer, E. Hughlett
{"title":"采用C4NP技术制备的50μm间距无铅微凸点","authors":"B. Dang, D. Shih, Stephen Buchwalter, Cornelia Tsang, Chirag S. Patel, J. Knickerbocker, P. Gruber, Sarah Knickerbocker, J. Garant, Krystyna Semkow, K. Ruhmer, E. Hughlett","doi":"10.1109/ECTC.2008.4550175","DOIUrl":null,"url":null,"abstract":"Controlled collapse chip connection new process (C4NP) is currently used in IBM manufacturing for all 300 mm Pb-free wafer bumping for flip chip packages. In this study, the extendibility of C4NP technology to ultra fine pitch applications has been explored. Reusable C4NP glass molds were fabricated and characterized for 50 mum pitch application. Mold fill and wafer transfer with Pb-free solders have been demonstrated using both 200 mm and 300 mm wafers in a manufacturing environment. Significant improvement in bump yield was achieved for these early demonstrations of fine pitch interconnections through process optimization and contamination control. Challenge in wafer inspection metrology is discussed for the 50 mum pitch micro-bumps. Mechanical strength of the C4NP micro-bumps has been characterized using test dies with a full area array of micro-bumps.","PeriodicalId":378788,"journal":{"name":"2008 58th Electronic Components and Technology Conference","volume":"65 Suppl 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"28","resultStr":"{\"title\":\"50μm pitch Pb-free micro-bumps by C4NP technology\",\"authors\":\"B. Dang, D. Shih, Stephen Buchwalter, Cornelia Tsang, Chirag S. Patel, J. Knickerbocker, P. Gruber, Sarah Knickerbocker, J. Garant, Krystyna Semkow, K. Ruhmer, E. Hughlett\",\"doi\":\"10.1109/ECTC.2008.4550175\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Controlled collapse chip connection new process (C4NP) is currently used in IBM manufacturing for all 300 mm Pb-free wafer bumping for flip chip packages. In this study, the extendibility of C4NP technology to ultra fine pitch applications has been explored. Reusable C4NP glass molds were fabricated and characterized for 50 mum pitch application. Mold fill and wafer transfer with Pb-free solders have been demonstrated using both 200 mm and 300 mm wafers in a manufacturing environment. Significant improvement in bump yield was achieved for these early demonstrations of fine pitch interconnections through process optimization and contamination control. Challenge in wafer inspection metrology is discussed for the 50 mum pitch micro-bumps. Mechanical strength of the C4NP micro-bumps has been characterized using test dies with a full area array of micro-bumps.\",\"PeriodicalId\":378788,\"journal\":{\"name\":\"2008 58th Electronic Components and Technology Conference\",\"volume\":\"65 Suppl 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-05-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"28\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 58th Electronic Components and Technology Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECTC.2008.4550175\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 58th Electronic Components and Technology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2008.4550175","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Controlled collapse chip connection new process (C4NP) is currently used in IBM manufacturing for all 300 mm Pb-free wafer bumping for flip chip packages. In this study, the extendibility of C4NP technology to ultra fine pitch applications has been explored. Reusable C4NP glass molds were fabricated and characterized for 50 mum pitch application. Mold fill and wafer transfer with Pb-free solders have been demonstrated using both 200 mm and 300 mm wafers in a manufacturing environment. Significant improvement in bump yield was achieved for these early demonstrations of fine pitch interconnections through process optimization and contamination control. Challenge in wafer inspection metrology is discussed for the 50 mum pitch micro-bumps. Mechanical strength of the C4NP micro-bumps has been characterized using test dies with a full area array of micro-bumps.