电子束抽运Arf准分子激光器的建模*

T. Petrova, G. Petrov, M. Wolford, A. Schmitt, J. Giuliani, S. Obenschain
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引用次数: 1

摘要

本文介绍了电子束抽运ArF激光器建模的初步工作。这些努力将在nrlelectrafility的实验中进行测试。与KrF[1]相比,使用ArF作为直接驱动激光聚变的驱动器的优点是:波长更短(ArF*为193 nm, KrF*为248 nm),带宽更宽。使用ArF驱动器应该比KrF产生更强大的高能量增益聚变内爆,甚至比用于NIF的351nm激光技术具有更大的优势。F2与ArF[2]的较小吸收截面在构建大型高能放大器时具有优势。此外,它可能具有比KrF更高的本征效率[3]。电子束抽运ArF*准分子激光器的理论模型正在研制中。这项工作的目标之一是了解ArF激光器的ar - f2混合物中的能量沉积,并与KrF激光器的ar - kr - f2混合物进行比较[4,5]。通过求解电子能量分布函数的稳态玻尔兹曼方程,得到了与电子的碰撞率作为f2浓度和功率沉积的函数。我们使用激发电离比的概念来获得在大范围输入参数(如束流功率、气体压力和初始气体成分)下缓慢变化的速率。这些速率与基于NRLOrestessuite数值模型的一维时间依赖等离子体化学相耦合。它包括等离子体化学反应和ArF*分子的振动种群动力学,以及用于放大自发发射(ASE)的3d辐射输运。输入参数是电子束时间剖面、气体成分和系统几何形状(具有初始激光种子特性的激光放大器配置类型)。可测量的等离子体参数,如物质浓度、电子和气体温度,以及激光参数,如小信号增益、不饱和吸收、饱和激光强度和AES,作为输入功率和电子束高功率状态下气体成分的函数来计算。将模型结果与有限的ArF激光器实验测量文献进行了比较。
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Modeling of an Electron-Beam Pumped Arf Excimer Laser *
We present here initial efforts to advance the modeling of electron-beam-pumped ArF lasers. These efforts will be tested against experiments using the NRLElectrafacility. The advantages of using ArF as a driver for direct drive laser fusion compared to KrF [1]are: shorter wavelength (193 nm for ArF* vs. 248 nm for KrF*) and broader bandwidth. Use of ArF driver should lead to more robust higher-energy-gain fusion implosions than KrF, with an even larger advantage over the 351 nm laser technology used on NIF. The smaller absorption cross section by F2 with ArF [2]is an advantage in constructing large, high-energy amplifiers. In addition, it may have higher intrinsic efficiency than KrF [3]. A theoretical model of an e-beam pumped ArF* excimer laser is under development. One of the goals of this work is to understand the energy deposition in Ar-F2mixture for ArF lasers and compare to Ar-Kr-F2mixture for KrF lasers [4, 5]. The collisional rates with electrons are obtained as a function of F2concentration and power deposition by solving the steady-state Boltzmann equation for the electron energy distribution function. We use the concept of excitation-to-ionization ratios to obtain slowly varying rates over a wide range of input parameters such as beam power, gas pressure, and initial gas composition. These rates are coupled to a 1D time-dependent plasma chemistry based on NRLOrestessuite of numerical models. It includes plasma chemistry reactions and vibrational population kinetics of ArF* molecules, coupled to a 3D-radiation transport for the amplified spontaneous emission (ASE). The input parameters are the e-beam temporal profile, gas composition, and system geometry (type of laser amplifier configuration with initial laser seed characteristics). Measurable plasma parameters, such as species concentrations, electron and gas temperatures, as well as laser parameters, such as small signal gain, non-saturable absorption, saturated laser intensity, and AES are calculated as a function of input power and gas composition in the e-beam high-power regime. The model results are compared with the limited experimental measurement literature for ArF lasers.
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