微波驱动反应等离子体射流加工N-BK7超精密表面

Faezeh Kazemi, G. Boehm, T. Arnold
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引用次数: 4

摘要

化学反应等离子体喷射加工(PJM)是一种非接触、高效的表面加工技术,越来越多地应用于各种光学元件的表面形状生成和误差校正。然而,将氟基PJM应用于N-BK7®的表面加工是具有挑战性的,因为反应等离子体与N-BK7的金属成分之间的化学相互作用会在等离子体处理区域的接触区和周围产生残留层。注意到残余层降低了获得必要表面轮廓的能力,并导致与蚀刻时间有关的非线性和难以预测的去除行为。本文对氟基PJM在N-BK7表面加工中的应用进行了广泛的研究,特别是在自由曲面光学元件的制造方面。为此,利用SEM/EDX分析对残余层的化学成分进行了评价,旨在阐明等离子体产生的活性粒子与N-BK7表面原子之间的化学动力学。此外,将N-BK7的蚀刻行为与熔融二氧化硅进行了比较,验证了所得结果的最优性。最后,在不同的等离子体停留时间下对区域加工进行了测试,以评估结果的可预测性和规律性。
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Ultra-precise surface machining of N-BK7 using microwave-driven reactive plasma jet machining
Chemically reactive Plasma Jet Machining (PJM) is a contactless and efficient surface machining technique increasingly applied to the surface shape generation and error correction of various optical elements. However, the application of fluorine-based PJM to surface machining of N-BK7® is challenging since the chemical interaction between reactive plasma species and metal components of N-BK7 induces a residual layer in the contact zone and surrounding of the plasma-treated area. It was noticed that a residual layer degrades the ability of obtaining the prerequisite surface profile and causes a nonlinear and hardly predictable removal behavior with respect to the etching time. In this paper, extensive studies are conducted for relaxing constraints in applying the fluorine-based PJM to the surface machining of N-BK7, particularly regarding to the manufacture of freeform optical elements. In this regard, the chemical composition of residual layer is evaluated by using SEM/EDX analysis aiming at clarifying the chemical kinetics between plasma generated active particles and the N-BK7 surface atoms. Furthermore, the etching behavior of N-BK7 is compared with Fused Silica to verify the optimality of obtained results. Finally, the area machining is tested at different plasma dwell times to evaluate the predictability and regularity of results.
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