不同沉积工艺制备的二氧化硅和铪薄膜的激光损伤

SPIE Laser Damage Pub Date : 2007-12-20 DOI:10.1117/12.752952

L. Gallais, J. Capoulade, J. Natoli, M. Commandré, M. Cathelinaud, Cian Koc, M. Lequime

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引用次数: 3

摘要

对不同工艺制备的单层涂层的抗激光损伤性能进行了比较研究。采用双离子束溅射、电子束沉积(有或没有离子辅助)和反应性低压离子镀技术在熔融二氧化硅衬底上沉积了HfO2和SiO2薄膜。使用纳秒脉冲YAG激光器和1对1测试程序在1064nm和355nm处确定了这些涂层的激光损伤阈值。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Laser damage of silica and hafnia thin films made with different deposition technologies

A comparative study is made on the laser damage resistance of monolayers coatings made with different technologies. HfO2 and SiO2 thin films have been deposited on fused silica substrates with Dual Ion Beam Sputtering, Electron Beam Deposition (with and without Ion Assistance) and Reactive Low Voltage Ion Plating technologies. The laser damage thresholds of these coatings have been determined at 1064nm and 355nm using a nanosecond pulsed YAG laser, and a 1-on-1 test procedure.

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SPIE Laser Damage

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