在lo - gan衬底上生长的AlGaInN激光二极管与在蓝宝石衬底上生长的AlGaInN激光二极管

T. Asano, T. Tojyo, K. Yanashima, M. Takeya, T. Hino, S. Ikeda, S. Kijima, S. Ansai, K. Shibuya, S. Goto, S. Tomiya, Y. Yabuki, T. Aoki, S. Uchida, M. Ikeda
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引用次数: 1

摘要

由于氮化镓和蓝宝石的晶格常数和热膨胀系数差异大,导致位错密度高,限制了氮化镓基紫色激光二极管的寿命。为了降低位错密度,提出了外延横向过度生长(ELO)技术,从而提高了AlGaInN激光器的性能。在这项工作中,我们比较了在ELO-GaN上生长的AlGaInN激光器和在蓝宝石衬底上生长的AlGaInN激光器的激光特性。
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AlGaInN laser diodes grown on an ELO-GaN substrate vs. on a sapphire substrate
The lifetime of AlGaInN-based violet laser diodes is restricted by the high dislocation densities caused by the large difference between the lattice constants and thermal expansion coefficients of GaN and sapphire. In order to reduce the dislocation density, epitaxial lateral overgrowth (ELO) techniques have been proposed, leading to the higher performance of AlGaInN lasers. In this work, we compared the lasing characteristics of AlGaInN lasers grown on ELO-GaN with those grown on sapphire substrates.
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