{"title":"多层周期均匀性和软x射线成像系统的性能","authors":"J. Kortright, R. Watts","doi":"10.1364/sxray.1991.thb2","DOIUrl":null,"url":null,"abstract":"Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Multilayer Period Uniformity and Performance of Soft X-ray Imaging Systems\",\"authors\":\"J. Kortright, R. Watts\",\"doi\":\"10.1364/sxray.1991.thb2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1991.thb2\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.thb2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Multilayer Period Uniformity and Performance of Soft X-ray Imaging Systems
Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.