在电流模式下工作的晶体管的电流/电压特性

J. Carroll, P. Probert
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引用次数: 3

摘要

研究了Si -n -p- n晶体管在几纳秒内脉冲进入二次击穿时的电流/电压特性。集电极/基极特性的极限由Ie= 0给出,这可以通过忽略重组来近似地建模,而Ib= 0则要求完全理解重组。后一种情况与柯克效应非常相似,即空穴和电子组成的等离子体靠近基区。在所有这些二次击穿状态中,电子倍增系数很低,通常小于1.33,因此几乎没有有用的倍增增益。因此,第二次击穿防止晶体管被用作3端雪崩晶体管。在Ie= 0状态下,高电流水平的故障最容易发生。电压的削减和电流的增加可以通过剪裁集电极杂质轮廓来限制。这两个特点提出了改进晶体管的方法,以防止通过电流模二次击穿造成短脉冲烧毁。
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Current/voltage characteristics of transistors operating in current-mode second breakdown
The current/voltage characteristics of Si n-p-ntransistors, when the device is pulsed into second breakdown for several nanoseconds, are studied. The collector/base characteristics have limits given by Ie= 0 which can be modelled approximately by neglecting recombination, and by Ib= 0 which requires recombination to be fully understood. This later condition is closely analagous to the Kirk effect with a plasma of holes and electrons close to the base region. In all these second-breakdown states the electron multiplication factor is low, typically less than 1.33, so that there is little useful multiplication gain. Second breakdown thus prevents the transistor from being used as a 3-terminal avalanche transistor. Failure at high current levels occurs most readily in the Ie= 0 state. The cutback in voltage and increase in current can be limited by tailoring the collector impurity profile. These two features suggest ways in which transistors may be improved to protect them against short pulse burnout via current-mode second breakdown.
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