用于无线通信的0.35μm SPDT RF CMOS开关

B. S. Iksannurazmi, A. Nordin, A. Alam
{"title":"用于无线通信的0.35μm SPDT RF CMOS开关","authors":"B. S. Iksannurazmi, A. Nordin, A. Alam","doi":"10.1109/RSM.2013.6706485","DOIUrl":null,"url":null,"abstract":"In recent years, wireless communication particularly in the front-end transceiver architecture has increased its functionality. This trend is continuously expanding and of particular is reconfigurable radio frequency (RF) front-end. A multi-band single chip architecture which consists of an array of switches and filters could simplify the complexity of the current superheterodyne architecture. In this paper, the design of a Single Pole Double Throw (SPDT) switch using 0.35μm Complementary Metal Oxide Semiconductor (CMOS) technology is discussed. The SPDT RF CMOS switch was then simulated in the range of frequency of 0-2GHz. At 2 GHz, the switch exhibits insertion loss of 1.153dB, isolation of 21.24dB, P1dB of 21.73dBm and IIP3 of 26.02dBm. Critical RF T/R switch characteristic such as insertion loss, isolation, power 1dB compression point and third order intercept point, IIP3 is discussed and compared with other type of switch designs. Pre and post layout simulation of the SPDT RF CMOS switch are also discussed to analyze the effect of parasitic capacitance between components' interconnection.","PeriodicalId":346255,"journal":{"name":"RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"0.35μm SPDT RF CMOS switch for wireless communication application\",\"authors\":\"B. S. Iksannurazmi, A. Nordin, A. Alam\",\"doi\":\"10.1109/RSM.2013.6706485\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In recent years, wireless communication particularly in the front-end transceiver architecture has increased its functionality. This trend is continuously expanding and of particular is reconfigurable radio frequency (RF) front-end. A multi-band single chip architecture which consists of an array of switches and filters could simplify the complexity of the current superheterodyne architecture. In this paper, the design of a Single Pole Double Throw (SPDT) switch using 0.35μm Complementary Metal Oxide Semiconductor (CMOS) technology is discussed. The SPDT RF CMOS switch was then simulated in the range of frequency of 0-2GHz. At 2 GHz, the switch exhibits insertion loss of 1.153dB, isolation of 21.24dB, P1dB of 21.73dBm and IIP3 of 26.02dBm. Critical RF T/R switch characteristic such as insertion loss, isolation, power 1dB compression point and third order intercept point, IIP3 is discussed and compared with other type of switch designs. Pre and post layout simulation of the SPDT RF CMOS switch are also discussed to analyze the effect of parasitic capacitance between components' interconnection.\",\"PeriodicalId\":346255,\"journal\":{\"name\":\"RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RSM.2013.6706485\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RSM.2013.6706485","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

近年来,无线通信特别是前端收发器架构的功能不断增加。这一趋势正在不断扩大,特别是可重构射频(RF)前端。由一组开关和滤波器组成的多频带单芯片结构可以简化当前超外差结构的复杂性。本文讨论了一种基于0.35μm互补金属氧化物半导体(CMOS)技术的单极双掷(SPDT)开关的设计。然后在0-2GHz频率范围内对SPDT RF CMOS开关进行了仿真。在2ghz时,该开关的插入损耗为1.153dB,隔离度为21.24dB, P1dB为21.73dBm, IIP3为26.02dBm。讨论了射频T/R开关的插入损耗、隔离、功率1dB压缩点和三阶截距点IIP3等关键特性,并与其他类型开关设计进行了比较。对SPDT射频CMOS开关进行了前后布局仿真,分析了元件间互连寄生电容的影响。
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0.35μm SPDT RF CMOS switch for wireless communication application
In recent years, wireless communication particularly in the front-end transceiver architecture has increased its functionality. This trend is continuously expanding and of particular is reconfigurable radio frequency (RF) front-end. A multi-band single chip architecture which consists of an array of switches and filters could simplify the complexity of the current superheterodyne architecture. In this paper, the design of a Single Pole Double Throw (SPDT) switch using 0.35μm Complementary Metal Oxide Semiconductor (CMOS) technology is discussed. The SPDT RF CMOS switch was then simulated in the range of frequency of 0-2GHz. At 2 GHz, the switch exhibits insertion loss of 1.153dB, isolation of 21.24dB, P1dB of 21.73dBm and IIP3 of 26.02dBm. Critical RF T/R switch characteristic such as insertion loss, isolation, power 1dB compression point and third order intercept point, IIP3 is discussed and compared with other type of switch designs. Pre and post layout simulation of the SPDT RF CMOS switch are also discussed to analyze the effect of parasitic capacitance between components' interconnection.
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