{"title":"一种用于精密光学测试的波动装置","authors":"D. Attwood","doi":"10.1364/sxray.1992.tuc1","DOIUrl":null,"url":null,"abstract":"The development of reflective optics for projection soft x-ray lithography will require new tools, previously available only at longer wavelengths. Among these is a test facility for large numerical aperture interferometry at short wavelengths. As with visible light interferometry this is most effectively done with coherent radiation. In this paper we discuss the spatial and temporal coherence properties of undulator radiation, wavelength tuning range, design tradeoffs involving harmonic content and thermal loading, and challenges associated with at-wavelength interferometry of complex surfaces. Preliminary plans for such a facility at Berkeley's Advanced Light Source will be discussed. This work is supported by DARPA, AFOSR, and DOE/BES.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"209 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An Undulator Facility for Precision Optical Testing\",\"authors\":\"D. Attwood\",\"doi\":\"10.1364/sxray.1992.tuc1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The development of reflective optics for projection soft x-ray lithography will require new tools, previously available only at longer wavelengths. Among these is a test facility for large numerical aperture interferometry at short wavelengths. As with visible light interferometry this is most effectively done with coherent radiation. In this paper we discuss the spatial and temporal coherence properties of undulator radiation, wavelength tuning range, design tradeoffs involving harmonic content and thermal loading, and challenges associated with at-wavelength interferometry of complex surfaces. Preliminary plans for such a facility at Berkeley's Advanced Light Source will be discussed. This work is supported by DARPA, AFOSR, and DOE/BES.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"209 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1992.tuc1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.tuc1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An Undulator Facility for Precision Optical Testing
The development of reflective optics for projection soft x-ray lithography will require new tools, previously available only at longer wavelengths. Among these is a test facility for large numerical aperture interferometry at short wavelengths. As with visible light interferometry this is most effectively done with coherent radiation. In this paper we discuss the spatial and temporal coherence properties of undulator radiation, wavelength tuning range, design tradeoffs involving harmonic content and thermal loading, and challenges associated with at-wavelength interferometry of complex surfaces. Preliminary plans for such a facility at Berkeley's Advanced Light Source will be discussed. This work is supported by DARPA, AFOSR, and DOE/BES.