一种提高激光损伤阈值的激光预处理工艺,以及对IBS薄膜长时间激光暴露的细微激光损伤的研究

Dale C. Ness, A. Streater
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引用次数: 2

摘要

离子束溅射(IBS)薄膜的1064nm,调q,低重复率操作的激光损伤测试通常涉及可以通过视觉或摄影检测到的小物理缺陷的测量。对于这种损伤,小吸收器模型充分地描述了大部分观测结果。我们讨论了为什么IBS抗反射(AR)涂层的损伤阈值低于高反射器和偏振器。我们报告了一种新的工艺技术,可以消除对IBS AR涂层的物理损伤,影响高达21 J/cm2,甚至可能更高。该工艺的成功和AR的较低损伤表明,小吸收剂位于基材/涂层界面或基材的亚表面区域。我们还讨论了正在进行的实验,以寻找在长期暴露于调q 1064nm辐射和连续355nm辐射下,涉及薄膜材料光学参数变化的细微激光损伤形式。
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A laser preconditioning process for improving the laser damage threshold, and the search for subtle laser damage from long-duration laser exposure for IBS thin films
Laser damage testing of ion beam sputtered (IBS) films for 1064 nm, Q-switched, low repetition rate operation typically involves the measurement of small physical defects that can be detected visually or photographically. For this kind of damage the small absorber model adequately describes most of the observations. We discuss why the damage threshold for IBS anti-reflection (AR) coatings is lower than for high reflectors and polarizers. We report on a new process technique that eliminates the physical damage to IBS AR coatings for fluences up to 21 J/cm2, possibly higher. The success of this process and the lower damage for AR's indicates that the small absorbers are at the substrate/coating interface or are in the subsurface region of the substrate. We also discuss ongoing experiments to look for subtle forms of laser damage involving changes of the optical parameters of the thin film materials, under long-term exposure to Q-switched 1064 nm radiation and continuous 355 nm radiation.
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