羟基磷灰石(HAp)涂层在蚀刻钛网基体上的电沉积

N. Isa, Y. Mohd, N. Yury
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引用次数: 0

摘要

本研究是为了研究电沉积技术在蚀刻钛网基体上形成羟基磷灰石(HAp)涂层。在CaCl2和NH4H2PO4 (Ca/P比值为1.67)溶液中,在80°C条件下,在−0.8 V和−1.5 V vs Ag/AgCl阴极电位下沉积30 min。另一方面,在镀液中加入壳聚糖溶液,研究其对涂层形貌的影响。利用FESEM和EDAX分别观察了沉积前后Ti表面的形貌和元素组成。蚀刻工艺使钛表面形貌由光滑变为粗糙。在−0.8 V和−1.5 V下沉积的HAp涂层形貌相似,呈花状结构。而在−1.5 V电位下沉积时,涂层更加致密致密。当壳聚糖加入到浴液中时,涂层的形态结构发生了明显的变化,从花状结构转变为与壳聚糖网状结构相互连接的片状结构。
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Electrodeposition of hydroxyapatite (HAp) coatings on etched titanium mesh substrate
This study was carried out in order to investigate the formation of hydroxyapatite (HAp) coatings on etched Ti mesh substrate using electrodeposition technique. The coatings were deposited from solution containing CaCl2 and NH4H2PO4 (with Ca/P ratio being 1.67) by maintaining cathodic potentials for − 0.8 V and − 1.5 V vs Ag/AgCl for 30 min at 80 °C. On the other hand, chitosan solution was also added into bath solution to study its effect on coatings morphology. The surface morphology and the elemental compositions of the Ti surface before and after deposition were observed by FESEM and EDAX, respectively. Etching process has changed the morphology of the Ti surface from smooth to rough surface. HAp coatings deposited at − 0.8 V and − 1.5 V have similar morphology with flower-like structure. However, the coatings are more dense and compact when deposited at higher potential (i.e.: − 1.5 V). When chitosan was added into bath solution, the morphological structure of the coating was significantly changed from flower-like structure to flake-like structure interconnected with net-like structure of chitosan.
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