缺陷位点对跳跃模型载流子迁移率增强的影响

T. Osotchan, S. Pengmanayol
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引用次数: 0

摘要

用跳跃模型描述了无序材料中的载流子迁移率,并用蒙特卡罗方法对矩形跳跃位进行了模拟,研究了现有缺陷或杂质位迁移率值的增加。在隧穿速率相同的情况下,缺陷位点能量越高,迁移率值越高,在该位点能量约为宿主能量的1.04倍处达到饱和。它发现最大的移动性发生在大约有40%缺陷的地方。当到缺陷位置的隧道速率降低时,最大迁移率出现在更高百分比的缺陷位置。此外,当缺陷位点的能量低于宿主位点能量的0.92倍时,出现另一种类型的移动性增强,这种情况仅发生在少量缺陷位点(少于10%)。这种类型的增强表现出更高的载流子迁移率值,结果表明迁移率值约为宿主值的三倍。
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Effect of Defect Sites in Charge Carrier Mobility Enhancement of Hopping Model
Charge carrier mobility in disorder materials was described by hopping model and the increasing in the mobility value of existing defect or impurity sites was investigated by Monte Carlo simulation of the rectangular hopping site. In the case of equal tunneling rate, the mobility value increases when the defect sites have higher energy and becomes saturate at the site energy about 1.04 times of the host energy. It found that the maximum mobility occurs when there are defect sites about 40 percents. When the tunneling rate to the defect site is reduced the maximum mobility occurs at higher percent of defect sites. In addition the other type of mobility enhancement appears when the defect site has energy lower than 0.92 times of the host site energy and this occurs only at small amount of the defect sites (less than 10 percents). This type of the enhancement exhibits much higher value of the carrier mobility and the result indicates the mobility value up to about three times of the host value.
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