(后期)FPGA应用中NMOSFET通闸的可靠性和性能考虑

B. Kaczer, C. Chen, J. Watt, K. Chanda, P. Weckx, M. T. Luque, G. Groeseneken, T. Grasser
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引用次数: 0

摘要

在一些数字CMOS应用中,如现场可编程门阵列(fpga)中使用的仅nmosfet通栅极显然容易受到正偏置温度不稳定性(PBTI)的影响。在这里,我们从捕获和发射时间(CET)图的角度讨论了PBTI频率和工作负载对高k/金属栅极nmosfet的影响,并定量解释了我们测试电路的退化。从深度尺度nmosfet中的单个捕获事件,我们预测了10年的PBTI分布。最后,我们表明,在增加的电源电压下,通栅极速度下降被信号传输加速所抵消,从而导致净性能改善。
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(Late) Reliability and performance considerations for NMOSFET pass gates in FPGA applications
The NMOSFET-only pass gates used in some digital CMOS applications, such as the Field-Programmable Gate Arrays (FPGAs), are apparently vulnerable to Positive Bias Temperature Instability (PBTI). Here we discuss the impact of PBTI frequency and workload on high-k/metal-gate NMOSFETs in terms of Capture-and-Emission Time (CET) maps and quantitatively explain the degradation of our test circuit. From individual trapping events in deeply-scaled NMOSFETs we then project PBTI distributions at 10 years. Finally, we show that at increased supply voltage the pass gate speed degradation is outweighed by signal transfer speedup, resulting in a net performance improvement.
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