V.F. Dryakhlushin, N.V. Vostokov, A. Klimov, V. V. Rogov, V. Shashkin
{"title":"扫描近场光学光刻方法","authors":"V.F. Dryakhlushin, N.V. Vostokov, A. Klimov, V. V. Rogov, V. Shashkin","doi":"10.1109/CRMICO.2002.1137312","DOIUrl":null,"url":null,"abstract":"A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements; is developed. The nanoelements; with characteristic dimensions of about 50 nm are fabricated.","PeriodicalId":378024,"journal":{"name":"12th International Conference Microwave and Telecommunication Technology","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Method of scanning near-field optical lithography\",\"authors\":\"V.F. Dryakhlushin, N.V. Vostokov, A. Klimov, V. V. Rogov, V. Shashkin\",\"doi\":\"10.1109/CRMICO.2002.1137312\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements; is developed. The nanoelements; with characteristic dimensions of about 50 nm are fabricated.\",\"PeriodicalId\":378024,\"journal\":{\"name\":\"12th International Conference Microwave and Telecommunication Technology\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-09-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th International Conference Microwave and Telecommunication Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CRMICO.2002.1137312\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th International Conference Microwave and Telecommunication Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CRMICO.2002.1137312","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements; is developed. The nanoelements; with characteristic dimensions of about 50 nm are fabricated.
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