垂直布里奇曼法生长CdTe晶体的表征

M. Fiederle, A. Fauler, V. Babentsov, J. Franc, J. Ludwig, K. Benz
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引用次数: 14

摘要

用垂直布里奇曼法生长出直径从25毫米到75毫米的碲化镉晶体。为了获得稳定的生长条件,通过现场温度监测调节生长速率和温度梯度。为了提高结晶度,采用了几种改性方法。改进的努力可以通过孪晶的减少和大单晶晶粒的生长来证明,其生长速度可达40/spl倍/40 mm/sup / 2/。采用不同的掺杂剂可获得5/spl倍/10/sup 8/欧姆至2/spl倍/10/sup 10/欧姆的电阻率。
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Characterization of CdTe crystals grown by the Vertical Bridgman method
CdTe crystals had been grown by the Vertical Bridgman method with diameters from 25 mm up to 75 mm. To obtain stable growth conditions the growth rate and temperature gradient had been adjusted by in-situ temperature monitoring. Several modifications had been applied to improve crystallinity. The effort of the improvements could be demonstrated by reduction of twins and the growth of large single crystalline grains up to 40/spl times/40 mm/sup 2/. Different dopants had been applied to obtain resistivities of 5/spl times/10/sup 8/ Ohmcm up to 2/spl times/10/sup 10/ Ohmcm.
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