用铜衬底模拟空气轴承表面材料的腐蚀研究

S. Chatruprachewin, C. Nuthong
{"title":"用铜衬底模拟空气轴承表面材料的腐蚀研究","authors":"S. Chatruprachewin, C. Nuthong","doi":"10.1109/ECTICON.2013.6559525","DOIUrl":null,"url":null,"abstract":"Corrosion defect is one of the important defects found in hard disk drive manufacturing. Fail to detect this defect might lead to fatal hard disk drive failure. In general, corrosion defect was found after the end of process. The fundamental methodology used to measure corrosion defect in head magnetic process of hard disk drive manufacturing is Electrochemical impedance spectroscopy (EIS). This method applies a low frequency voltage to a chemical cell in order to measure corrosion rate which is defined as a reaction of material in aqueous solution. The data obtained from EIS measurement method are complex and thus hard to analyze. Furthermore, EIS method is destructive materials measurement and the obtained results cannot well predict corrosion behavior of the system. However, head magnetic materials/slider is a stack of three materials in layers i.e. soft magnetic layer, diamond like carbon (DLC) layer, and photoresist layer respectively. These three stack layer of slider can be replaced by R-C equivalent circuit. Nyquist plot and Bode plot are used to observe the frequency response of the equivalent circuit. This observation can help in prediction of corrosion behavior before starting of mass fabrication or transferring to new materials. This work shows that the results obtained from an equivalent R-C circuit model of copper substrate coated with photoresist and the one obtained from EIS method are comparable. It should be noted that the parameters of R-C equivalent circuits are modified for corrosion behavior studying according to two different types of photoresists.","PeriodicalId":273802,"journal":{"name":"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A simulation of air bearing surface materials with copper substrate for corrosion investigation\",\"authors\":\"S. Chatruprachewin, C. Nuthong\",\"doi\":\"10.1109/ECTICON.2013.6559525\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Corrosion defect is one of the important defects found in hard disk drive manufacturing. Fail to detect this defect might lead to fatal hard disk drive failure. In general, corrosion defect was found after the end of process. The fundamental methodology used to measure corrosion defect in head magnetic process of hard disk drive manufacturing is Electrochemical impedance spectroscopy (EIS). This method applies a low frequency voltage to a chemical cell in order to measure corrosion rate which is defined as a reaction of material in aqueous solution. The data obtained from EIS measurement method are complex and thus hard to analyze. Furthermore, EIS method is destructive materials measurement and the obtained results cannot well predict corrosion behavior of the system. However, head magnetic materials/slider is a stack of three materials in layers i.e. soft magnetic layer, diamond like carbon (DLC) layer, and photoresist layer respectively. These three stack layer of slider can be replaced by R-C equivalent circuit. Nyquist plot and Bode plot are used to observe the frequency response of the equivalent circuit. This observation can help in prediction of corrosion behavior before starting of mass fabrication or transferring to new materials. This work shows that the results obtained from an equivalent R-C circuit model of copper substrate coated with photoresist and the one obtained from EIS method are comparable. It should be noted that the parameters of R-C equivalent circuits are modified for corrosion behavior studying according to two different types of photoresists.\",\"PeriodicalId\":273802,\"journal\":{\"name\":\"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-05-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECTICON.2013.6559525\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTICON.2013.6559525","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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摘要

腐蚀缺陷是硬盘制造中常见的重要缺陷之一。未能检测到此缺陷可能导致致命的硬盘驱动器故障。一般来说,腐蚀缺陷是在工艺结束后发现的。测量硬盘磁头磁性加工过程中腐蚀缺陷的基本方法是电化学阻抗谱法。这种方法在化学电池上施加低频电压来测量腐蚀速率,腐蚀速率被定义为物质在水溶液中的反应。EIS测量方法获得的数据复杂,难以分析。此外,EIS方法是破坏性材料测量,所得结果不能很好地预测体系的腐蚀行为。然而,磁头磁性材料/滑块是三层材料的堆叠,即软磁层、类金刚石碳(DLC)层和光刻胶层。这三层滑块的堆叠层可以用R-C等效电路代替。用奈奎斯特图和波德图观察等效电路的频率响应。这种观察有助于在开始批量制造或转移到新材料之前预测腐蚀行为。本文的研究结果表明,镀有光刻胶的铜衬底等效R-C电路模型与EIS方法的结果具有可比性。值得注意的是,根据两种不同类型的光阻剂,对R-C等效电路的腐蚀行为进行了修正。
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A simulation of air bearing surface materials with copper substrate for corrosion investigation
Corrosion defect is one of the important defects found in hard disk drive manufacturing. Fail to detect this defect might lead to fatal hard disk drive failure. In general, corrosion defect was found after the end of process. The fundamental methodology used to measure corrosion defect in head magnetic process of hard disk drive manufacturing is Electrochemical impedance spectroscopy (EIS). This method applies a low frequency voltage to a chemical cell in order to measure corrosion rate which is defined as a reaction of material in aqueous solution. The data obtained from EIS measurement method are complex and thus hard to analyze. Furthermore, EIS method is destructive materials measurement and the obtained results cannot well predict corrosion behavior of the system. However, head magnetic materials/slider is a stack of three materials in layers i.e. soft magnetic layer, diamond like carbon (DLC) layer, and photoresist layer respectively. These three stack layer of slider can be replaced by R-C equivalent circuit. Nyquist plot and Bode plot are used to observe the frequency response of the equivalent circuit. This observation can help in prediction of corrosion behavior before starting of mass fabrication or transferring to new materials. This work shows that the results obtained from an equivalent R-C circuit model of copper substrate coated with photoresist and the one obtained from EIS method are comparable. It should be noted that the parameters of R-C equivalent circuits are modified for corrosion behavior studying according to two different types of photoresists.
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