{"title":"改进的写入余量6T-SRAM用于低电源电压应用","authors":"F. Moradi, D. Wisland, H. Mahmoodi, T. Cao","doi":"10.1109/SOCCON.2009.5398053","DOIUrl":null,"url":null,"abstract":"In this paper a new technique to increase the write margin of 6T-SRAM cell is proposed. Using this technique the area of subthreshold SRAM cell is reduced and also the Write cycle is improved significantly with a lower area overhead. In this technique, PMOS stacked network is used to evaluate the write cycle. Based on behavior of devices in 65nm for weak inversion operation, this technique is proposed to decrease area overhead of 6T-SRAM in subthreshold region.","PeriodicalId":303505,"journal":{"name":"2009 IEEE International SOC Conference (SOCC)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Improved write margin 6T-SRAM for low supply voltage applications\",\"authors\":\"F. Moradi, D. Wisland, H. Mahmoodi, T. Cao\",\"doi\":\"10.1109/SOCCON.2009.5398053\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper a new technique to increase the write margin of 6T-SRAM cell is proposed. Using this technique the area of subthreshold SRAM cell is reduced and also the Write cycle is improved significantly with a lower area overhead. In this technique, PMOS stacked network is used to evaluate the write cycle. Based on behavior of devices in 65nm for weak inversion operation, this technique is proposed to decrease area overhead of 6T-SRAM in subthreshold region.\",\"PeriodicalId\":303505,\"journal\":{\"name\":\"2009 IEEE International SOC Conference (SOCC)\",\"volume\":\"51 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE International SOC Conference (SOCC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOCCON.2009.5398053\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International SOC Conference (SOCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOCCON.2009.5398053","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improved write margin 6T-SRAM for low supply voltage applications
In this paper a new technique to increase the write margin of 6T-SRAM cell is proposed. Using this technique the area of subthreshold SRAM cell is reduced and also the Write cycle is improved significantly with a lower area overhead. In this technique, PMOS stacked network is used to evaluate the write cycle. Based on behavior of devices in 65nm for weak inversion operation, this technique is proposed to decrease area overhead of 6T-SRAM in subthreshold region.