氮化铝涂层的硅场发射和氧化栅极,以提高可靠性的空间应用

L. Wang, K. Aplin, B. Kent, S. Huq, R. Stevens, G. Thomas, I. Loader, C. Collingwood, A. Malik, H. Blom
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摘要

本文介绍了用于保持航天器电荷中性的电子源硅场发射阵列涂层的研究进展。中和器规格包括6 mA的发射电流,0.2 W/mA,仪器需要工作寿命>6000小时。为了使场发射器件更能抵抗离子轰击和热失效,研究了添加氮化铝(AlN)层和铬栅电极热氧化对场发射器件的影响。在不同的腔压条件下,在发射体上溅射镀有不同厚度的氮化铝膜。用ESCA(电子能谱化学分析)和ERDA(弹性后坐力检测分析)对热氧化样品进行了分析。氧化铬的组成为Cr = 0.31, O = 0.69。
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AlN coatings on silicon field emitters and oxidised gates to enhance reliability for space applications
This paper describes the development of coatings for silicon field emission arrays used as an electron source to maintain spacecraft charge neutrality. The neutraliser specification includes 6 mA emission current at 0.2 W/mA and the instrument is required to operate for a lifetime of >6000 hours. To make the field emission device more resistant to ion bombardment and thermal failure, the effects of adding a layer of aluminium nitride (AlN), and thermal oxidation of the chromium gate electrode have been investigated. Different thicknesses of AlN film have been sputter coated onto the emitters under a variety of chamber pressure conditions. The thermally oxidised samples have been analysed by ESCA (Electron Spectroscopy for Chemical Analysis) and ERDA (Elastic Recoil Detection Analysis). For the oxidised chromium the composition is Cr = 0.31 and O = 0.69.
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