S. Anusha, Bommidi Shivanath Nikhil, K. Manoj, Kirti S. Pande
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引用次数: 2
摘要
半导体产业正在迅速发展,对存储器和更快存取存储器的需求也在增加。数据稳定性和能耗是采用SRAM的嵌入式处理器对高速缓存的基本要求。在较低的电源电压下,需要仔细检查的SRAM单元参数是数据稳定性、泄漏电流和延迟。为了进一步提高SRAM电池的稳定性,降低衬底(结)漏电流,本文介绍了MTCMOS ST SRAM电池。所提出的MTCMOS ST SRAM单元使用HVT和LVT mosfet,通过降低泄漏电流有助于降低平均功耗。使用Cadence Virtuoso实现、分析、验证了所提出的MTCMOS ST SRAM单元,并将其与现有的SRAM单元进行了比较,该SRAM单元的通道长度为45 nm,电源为500 mV。在提出MTCMOS圣SRAM单元,我)读稳定RSVNM是增长了5.89%,5.72%和4.74%(二)写稳定WTV是增长了4.16%,4.16%和5.05% iii)持有稳定HSNM增加了0.24%(四)能耗下降了58.87%,3.164%和66.49%相比传统6 t,现有8 t和现有9 SRAM t细胞分别v)整体阅读路径漏电流降低94.83%和87.420%,相比与现有8 t和现有9分别SRAM t细胞。
MTCMOS 8T SRAM Cell with Improved Stability and Reduced Power Consumption
The semiconductor industry is expanding swiftly and the demand for memory and faster access of memory is increasing. The data stability and energy usage are the basic requirements of cache memory in embedded processors that uses SRAM. The SRAM cell parameters that require scrutiny at lower supply voltages are data stability, leakage current and delay. In order to ameliorate the stability further and lower the substrate (junction) leakage current in comparison to the existing SRAM cells, the MTCMOS ST SRAM cell is introduced in this paper. The proposed MTCMOS ST SRAM cell uses HVT and LVT MOSFETs that helps in reduction of the average power consumption by subsiding the leakage current. The proposed MTCMOS ST SRAM cell is implemented, analysed, verified and compared to the existing SRAM cells using Cadence Virtuoso with a channel length of 45 nm at a power supply of 500 mV. In proposed MTCMOS ST SRAM cell, i) read stability RSVNM is increased by 5.89%, 5.72% and 4.74% ii) write stability WTV is increased by 4.16%, 4.16% and 5.05% iii) hold stability HSNM is increased by 0.24% iv) power consumption is decreased by 58.87%, 3.164% and 66.49% in comparison to conventional 6T, existing 8T and existing 9T SRAM cell respectively v) overall read path leakage current is reduced by 94.83% and 87.420%, when compared with existing 8T and existing 9T SRAM cell respectively.