{"title":"表达了微波等离子体化学材料加工中最佳气体压力的测定方法","authors":"S. V. Bordusov, S. I. Madveiko, A. Dostanko","doi":"10.1109/CRMICO.2010.5632811","DOIUrl":null,"url":null,"abstract":"A method of rapid determination of gas pressure value, which provides the most favorable conditions for microwave plasma chemical processing at low vacuum, is developed. The method is based on the characteristic property of microwave plasma materials processing which consists in pulsation nature of microwave discharge.","PeriodicalId":237662,"journal":{"name":"2010 20th International Crimean Conference \"Microwave & Telecommunication Technology\"","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Express method of determination of the gas pressure optimal for microwave plasma chemical materials processing\",\"authors\":\"S. V. Bordusov, S. I. Madveiko, A. Dostanko\",\"doi\":\"10.1109/CRMICO.2010.5632811\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A method of rapid determination of gas pressure value, which provides the most favorable conditions for microwave plasma chemical processing at low vacuum, is developed. The method is based on the characteristic property of microwave plasma materials processing which consists in pulsation nature of microwave discharge.\",\"PeriodicalId\":237662,\"journal\":{\"name\":\"2010 20th International Crimean Conference \\\"Microwave & Telecommunication Technology\\\"\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-11-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 20th International Crimean Conference \\\"Microwave & Telecommunication Technology\\\"\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CRMICO.2010.5632811\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 20th International Crimean Conference \"Microwave & Telecommunication Technology\"","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CRMICO.2010.5632811","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Express method of determination of the gas pressure optimal for microwave plasma chemical materials processing
A method of rapid determination of gas pressure value, which provides the most favorable conditions for microwave plasma chemical processing at low vacuum, is developed. The method is based on the characteristic property of microwave plasma materials processing which consists in pulsation nature of microwave discharge.