用射频PCVD法在硬质合金表面形成碳膜

J. Grabarczyk, P. Niedzielski, P. Louda
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摘要

本课题的目的是研究RF-PCVD方法中射频功率电极上的沉积参数和样品定位方法对覆盖硬质合金基体的碳涂层结构的影响。本文对木材工业中用于铣削木质基材料的硬质合金刀具的耐磨碳膜涂层进行了研究。以硬质合金刀头板为研究对象。它们的大小约为30/spl倍/12/spl倍/1.5。在沉积过程中应用了两类参数:所谓的“硬”参数,当偏置电压高于500V时,以及“软”参数,当偏置电压低于400V时。此外,甲烷流量、压力和沉积时间也发生了变化。为了在电极上正确定位切削刃,使用了三种类型的夹具。在硬质合金衬底上沉积碳膜的每个过程之前都要进行一小时的离子蚀刻。
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Forming carbon films on cemented carbide surface using RF PCVD method
The aim of the project described in this paper was to examine the influence parameters of deposition and the method of location of samples on an RF-power electrode in the RF-PCVD method on the structure of carbon coatings, which covered cemented carbide substrates. This researches precedes an investigation concerning the covering of cemented carbide cutting tools by wear resistant carbon films, with were used in wood industry for milling of wood-base materials. As an object of investigation cutter head plates made of cemented carbide were used. Their size was about 30/spl times/12/spl times/1.5. In the deposition processes two types of parameters were applied: so-called "hard" parameters, when the bias voltage was higher then 500V, and "soft" parameters, when the bias voltage was less then 400V. In addition the flow of methane, pressure, and time of deposition were changed. In order to properly locate the cutting edge on the electrode three types of holders were used. Every process of depositing the carbon film on a cemented carbide substrate was preceded by one hour of ion etching.
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