超快激光烧蚀沉积镓膜的巨大宽带光学非线性

Conference Digest. 2000 International Quantum Electronics Conference (Cat. No.00TH8504) Pub Date : 2000-09-10 DOI:10.1109/IQEC.2000.907841

V. Albanis, V. Fedotov, K. Macdonald, V. Emelyanov, N. Zheludev, R. Knize, B. Zhdanov, A. Rode

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摘要

镓-二氧化硅界面是一种结合了强非线性和皮秒开关时间的新型结构。本文报道了超快脉冲激光烧蚀在熔融二氧化硅上沉积的镓膜的光学非线性是非常宽的，从480 nm到810 nm。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Gigantic broadband optical nonlinearity in gallium films deposited by ultrafast laser ablation

Gallium-silica interfaces have emerged as a new type of structure that combines a strong nonlinearity with picosecond switching-on time. Here we report that the optical nonlinearity of gallium films deposited on fused silica by ultrafast pulsed laser ablation is very broadband, spanning from 480 nm to 810 nm.

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Conference Digest. 2000 International Quantum Electronics Conference (Cat. No.00TH8504)

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