壳聚糖对通过电沉积技术在钛上形成羟基磷灰石(HAp)涂层的影响

N. Isa, Y. Mohd, N. Yury
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引用次数: 2

摘要

在这项研究中,使用含 0.167 M CaCl2 + 0.1 M NH4H2PO4 的水溶液在钛 (Ti) 基质上电沉积了羟基磷灰石 (HAp) 涂层。通过添加 5 至 20 Vol. % 不等的壳聚糖,研究了壳聚糖对 HAp 涂层形成的影响。电沉积在 80 °C 下进行,持续 30 分钟,恒定施加电位为 - 1.5 V vs Ag/AgCl。在电沉积之前,对钛基底进行了酸蚀刻预处理,以去除氧化物并获得所需的粗糙度表面。在 HAp 涂层中加入壳聚糖并使其相互混合,可通过 "填充 "空间来减少纯 HAp 涂层中针状结构之间的空间。然而,在沉积溶液中添加过量的壳聚糖(即 20 Vol.%)会导致壳聚糖与钙离子竞争,从而与磷酸根离子结合,在涂层中占主导地位。XRD 图谱、傅里叶变换红外光谱和 EDAX 分析证实了壳聚糖在 HAp 涂层中的存在。因此,考虑到其经济性和简单的生产工艺,HAp/壳聚糖混合涂层被认为是未来作为生物医学植入材料应用的一个有吸引力的候选材料。
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Effect of chitosan on the formation of hydroxyapatite (HAp) coatings on titanium by electrodeposition technique
In this study, hydroxyapatite (HAp) coatings were electrodeposited onto titanium (Ti) substrates using an aqueous solution containing 0.167 M CaCl2 + 0.1 M NH4H2PO4. The effect of chitosan on the formation of HAp coatings were investigated by adding various amount of chitosan ranging from 5 to 20 vol. %. The electrodeposition was carried out at 80 °C for 30 min under constant applied potential at − 1.5 V vs Ag/AgCl. Prior to electrodeposition, the Ti substrates were pre-treated by acid etching to remove oxide and obtain desired roughness surface. The incorporation and intermingling of chitosan in the HAp coatings reduce the amount of space found between the needlelike structures in the pure HAp coatings by ‘filling in' the space. However, excessive amount of chitosan added in the deposition solution (i.e.: 20 vol. %) caused it to compete with calcium ions to incorporate with phosphate ions and dominating the coatings. XRD patterns, FTIR spectra and EDAX analyses confirmed that the presence of chitosan in the HAp coatings. So, considering its economic and simple production, a hybrid HAp/chitosan coating is thought to be an attractive candidate for future applications as biomedical implants material.
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