用介质电泳法生长用于场发射显示的金纳米线

D. Garner, N.Z. Mohd Zamin
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引用次数: 0

摘要

在报道的工作中,金纳米线在绝缘衬底上的两个共面电极之间生长,所得的金纳米线沿着绝缘衬底生长。结果表明,双向电泳(DEP)参数(交流电源电压和频率、电解质和胶体浓度)与所得线的形状和生长速度之间存在复杂的关系。这些被优化以提供较慢的生长速率,这样就可以形成更短、更坚固的金属丝,在洗涤和干燥样品时不会崩溃。尽管电线的宽高比很高,但场发射特性并不令人鼓舞,根据测试样品的不同,在20至100 V//spl mu/m的宏观电场范围内,电线的发射电流为1 /spl mu/A/cm/sup 2/。
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Growth of gold nanowires by dielectrophoresis for field-emission display applications
In the reported work, gold nanowires have been grown between two coplanar electrodes on an insulating substrate, with the resulting gold nanowires lying along the insulating substrate. It was found that there was a complicated relationship between the dielectrophoresis (DEP) parameters (AC supply voltage and frequency, electrolyte and colloid concentration) and the shape and growth rate of the resulting wires. These were optimised to give slower growth rates such that shorter, sturdier wires could be formed which did not collapse on washing and drying of the sample. Despite the high aspect ratio of the wires, field-emission characteristics were not encouraging, the wires displaying an emission current of 1 /spl mu/A/cm/sup 2/ at macroscopic electric fields ranging between 20 to 100 V//spl mu/m, depending upon the sample tested.
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