{"title":"应用分光光度法和椭偏法测定光学镀膜薄膜的光学参数","authors":"J. Domaradzki, S. Lis, D. Kaczmarek, S. Patela","doi":"10.1109/STYSW.2010.5714158","DOIUrl":null,"url":null,"abstract":"In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Application of spectrophotometry and ellipsometry for determination of optical parameters of optical coating thin films\",\"authors\":\"J. Domaradzki, S. Lis, D. Kaczmarek, S. Patela\",\"doi\":\"10.1109/STYSW.2010.5714158\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.\",\"PeriodicalId\":160376,\"journal\":{\"name\":\"2010 International Students and Young Scientists Workshop \\\"Photonics and Microsystems\\\"\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International Students and Young Scientists Workshop \\\"Photonics and Microsystems\\\"\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/STYSW.2010.5714158\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/STYSW.2010.5714158","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Application of spectrophotometry and ellipsometry for determination of optical parameters of optical coating thin films
In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.
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