de系列mosfet的传热

A. Swart
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引用次数: 1

摘要

MOSFET器件在过去几年中取得了显著发展,成为电力电子和电子通信中大功率应用的首选器件。市售设备(如IXYS RF制造)现在工作在VHF范围内,输出RF功率高达300 W。它们针对线性操作进行了优化,适用于广播和通信应用。本文介绍了夹在两个相同散热器之间的IXZ210N50L MOSFET的传热。结果显示,与漏极电流的每一步增加相比,从MOSFET顶部流出的热量呈线性减少。两张图(表示连接到MOSFET器件的顶部和底部散热器)对比了通过IXZ210N50L MOSFET的漏极电流保持恒定在5 A时Bisink技术的温升。与仅使用一个散热器的传统安装相比,Bisink技术具有更低的导通电阻和更高的输出功率,从而提高了可靠性和性能。结果进一步表明,环境温度必须在散热器附近测量。
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Heat Transfer of DE-Series MOSFETs
MOSFET devices have developed significantly over the past few years to become the number one choice for high-power applications in power electronics and electronic communication. Commercially available devices (such as the IXYS RF manufactured) now operate into the VHF range with output RF powers of up to 300 W. They are optimized for linear operation and suitable for broadcast and communication applications. This paper presents the heat transfer out of an IXZ210N50L MOSFET which is sandwiched between two identical heatsinks. The results reveal a linear decrease in heat flowing away from the top of the MOSFET when compared to the bottom of the MOSFET for each step increase of drain current. Two graphs (representing the top and bottom heatsinks connected to the MOSFET device) contrast the temperature rise for the Bisink technique when the drain current through the IXZ210N50L MOSFET is kept constant at 5 A. The Bisink technique has the advantages of lower on-state resistances and higher output powers when compared to the traditional mounting using only one heatsink, resulting in improved reliability and performance. Results further reveal that the ambient temperature must be measured in the vicinity of the heatsink.
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