升压变换器应用中氮化镓(GaN)和碳化硅(SiC)功率器件的高频开关限制

K. Shenai
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引用次数: 12

摘要

利用电路仿真和精确的电路仿真模型对升压DC-DC功率变换器中功率半导体器件的dv/dt开关限制进行了评估。考虑了最先进的商用硅CoolMOS器件,商用碳化硅(SiC)功率肖特基势垒二极管(SBD)和新兴的氮化镓(GaN)功率晶体管。研究表明,尽管SiC和GaN功率器件具有低存储电荷和小电容,但这些器件将经历高开关dv/dt应力,这可能会造成严重的开关限制,特别是在高频功率变换器中。由于SiC和GaN材料中存在高密度的晶体缺陷,这一问题可能会进一步加剧,这将表现为较差的现场可靠性。制定了设备选择的具体指导方针,以优化性能和现场可靠性。
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High-frequency switching limitations in Gallium Nitride (GaN) and Silicon Carbide (SiC) power devices for boost converter applications
The dv/dt switching limitations of power semiconductor devices in a boost DC-DC power converter are evaluated using circuit simulations and accurate circuit simulation models. State-of-the-art commercial silicon CoolMOS devices, commercial Silicon Carbide (SiC) power Schottky Barrier Diodes (SBD's), and emerging Gallium Nitride (GaN) power transistors are considered. It is shown that although SiC and GaN power devices have low stored charge and small capacitances, these devices will experience high switching dv/dt stresses which may pose serious switching limitations especially in high-frequency power converters. This problem is likely to be further exacerbated by the presence of a high density of crystal defects in SiC and GaN materials which will manifest in the form of poor field-reliability. Specific guidelines for device selection are developed in order to optimize both performance and field-reliability.
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