原子层外延法制备宽禁带II-VI化合物薄膜——性能与应用

M. Godlewski
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引用次数: 1

摘要

优化了原子层外延(ALE)生长技术,可生产大面积高效薄膜电致发光器件。简要介绍了ALE生长技术的优点及其应用。然后,他更详细地描述了从宽带隙II-VI半导体ALE薄膜中获得明亮的多色光发射的各种尝试,并解释了TFEL结构中发射激发的机制。描述和分析了获得亮蓝色、绿色和红色电致发光的竞争方法。
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Thin films of wide band gap II-VI compounds grown by atomic layer epitaxy-properties and application
The growth technique atomic layer epitaxy (ALE) has been optimised to produce large area and efficient thin film electroluminescent (TFEL) devices. The author briefly reviews the advantages of the ALE growth technique and its applications. He then describes in more detail various attempts to get a bright multi-colour light emission from wide band gap II-VI semiconductor ALE films, and explains the mechanisms of emission excitation in TFEL structures. Competing approaches to obtain bright blue, green and red electroluminescence are described and analysed.
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