不同衬底温度下纳米结构碘化铜(CuI)薄膜的电学特性

M. Amalina, A. Fahmy, N. A. Rasheid, M. Rusop
{"title":"不同衬底温度下纳米结构碘化铜(CuI)薄膜的电学特性","authors":"M. Amalina, A. Fahmy, N. A. Rasheid, M. Rusop","doi":"10.1109/SHUSER.2012.6268860","DOIUrl":null,"url":null,"abstract":"Mister atomizer technique or so called spray pyrolysis has been applied to deposit CuI thin films on amorphous substrate. The effects of substrate temperature (RT- 200°C) on their electrical and optical properties were studied. The physical characteristics of sprayed CuI were determined by field emission scanning electron microscopy (FESEM), current voltage (I-V) measurement and UV-VIS-NIR spectrophotometer. The nanoparticle of CuI was observed at different deposition condition. The effect of substrates temperature on thickness and resistivity proved that both decreases as the substrate temperature increased. This was caused by the increase of carrier concentration at higher substrate temperature. The transmittance and absorption coefficient was measured and then the energy gap was determined which shows the direct transition of n=2. The optimum band gap observed here is 2.75 eV at 150°C of substrate temperature.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The electrical characteristics of nanostructured Copper (I) Iodide (CuI) thin films sprayed at different substrate temperatures\",\"authors\":\"M. Amalina, A. Fahmy, N. A. Rasheid, M. Rusop\",\"doi\":\"10.1109/SHUSER.2012.6268860\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Mister atomizer technique or so called spray pyrolysis has been applied to deposit CuI thin films on amorphous substrate. The effects of substrate temperature (RT- 200°C) on their electrical and optical properties were studied. The physical characteristics of sprayed CuI were determined by field emission scanning electron microscopy (FESEM), current voltage (I-V) measurement and UV-VIS-NIR spectrophotometer. The nanoparticle of CuI was observed at different deposition condition. The effect of substrates temperature on thickness and resistivity proved that both decreases as the substrate temperature increased. This was caused by the increase of carrier concentration at higher substrate temperature. The transmittance and absorption coefficient was measured and then the energy gap was determined which shows the direct transition of n=2. The optimum band gap observed here is 2.75 eV at 150°C of substrate temperature.\",\"PeriodicalId\":426671,\"journal\":{\"name\":\"2012 IEEE Symposium on Humanities, Science and Engineering Research\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 IEEE Symposium on Humanities, Science and Engineering Research\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SHUSER.2012.6268860\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE Symposium on Humanities, Science and Engineering Research","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SHUSER.2012.6268860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

喷雾热解技术已被应用于在非晶基底上沉积CuI薄膜。研究了衬底温度(RT ~ 200℃)对其电学和光学性能的影响。采用场发射扫描电镜(FESEM)、电流电压(I-V)测量和紫外-可见-近红外分光光度计对喷涂后的CuI的物理特性进行了测定。在不同的沉积条件下,观察了纳米CuI的形貌。衬底温度对厚度和电阻率的影响随着衬底温度的升高而减小。这是由于在较高的底物温度下载流子浓度增加所致。测量了透射率和吸收系数,确定了能隙,表明n=2的直接跃迁。在衬底温度为150℃时观察到的最佳带隙为2.75 eV。
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The electrical characteristics of nanostructured Copper (I) Iodide (CuI) thin films sprayed at different substrate temperatures
Mister atomizer technique or so called spray pyrolysis has been applied to deposit CuI thin films on amorphous substrate. The effects of substrate temperature (RT- 200°C) on their electrical and optical properties were studied. The physical characteristics of sprayed CuI were determined by field emission scanning electron microscopy (FESEM), current voltage (I-V) measurement and UV-VIS-NIR spectrophotometer. The nanoparticle of CuI was observed at different deposition condition. The effect of substrates temperature on thickness and resistivity proved that both decreases as the substrate temperature increased. This was caused by the increase of carrier concentration at higher substrate temperature. The transmittance and absorption coefficient was measured and then the energy gap was determined which shows the direct transition of n=2. The optimum band gap observed here is 2.75 eV at 150°C of substrate temperature.
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