K. Bria, M. Ait El Fqih, A. Afkir, L. Jadoual, A. Kaddouri
{"title":"5 keV氪离子溅射钒靶颗粒角分布的模拟研究","authors":"K. Bria, M. Ait El Fqih, A. Afkir, L. Jadoual, A. Kaddouri","doi":"10.1051/epjap/2022220201","DOIUrl":null,"url":null,"abstract":"The sputtering of vanadium particles at normal incidence wassimulated. The SRIM-code combined to a new ANGULAIR and SDTrimSPsimulation was employed to obtain the sputtering yields and the angular distribution of the atoms. The simulation was made for a large number of incident Kr+ions with 5 keV energy, letting the computer count the number of emitted particles in the solid angle. The angular distribution of differential sputtering yields of vanadium shows an over-cosine tendency.","PeriodicalId":301303,"journal":{"name":"The European Physical Journal Applied Physics","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Angular Distribution of Particles Sputtered from the Vanadium Target by 5 keV Kr Ions: Simulation Study\",\"authors\":\"K. Bria, M. Ait El Fqih, A. Afkir, L. Jadoual, A. Kaddouri\",\"doi\":\"10.1051/epjap/2022220201\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The sputtering of vanadium particles at normal incidence wassimulated. The SRIM-code combined to a new ANGULAIR and SDTrimSPsimulation was employed to obtain the sputtering yields and the angular distribution of the atoms. The simulation was made for a large number of incident Kr+ions with 5 keV energy, letting the computer count the number of emitted particles in the solid angle. The angular distribution of differential sputtering yields of vanadium shows an over-cosine tendency.\",\"PeriodicalId\":301303,\"journal\":{\"name\":\"The European Physical Journal Applied Physics\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-08-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The European Physical Journal Applied Physics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1051/epjap/2022220201\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The European Physical Journal Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1051/epjap/2022220201","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Angular Distribution of Particles Sputtered from the Vanadium Target by 5 keV Kr Ions: Simulation Study
The sputtering of vanadium particles at normal incidence wassimulated. The SRIM-code combined to a new ANGULAIR and SDTrimSPsimulation was employed to obtain the sputtering yields and the angular distribution of the atoms. The simulation was made for a large number of incident Kr+ions with 5 keV energy, letting the computer count the number of emitted particles in the solid angle. The angular distribution of differential sputtering yields of vanadium shows an over-cosine tendency.
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