基于3D建模的SiO2/HfO2堆叠栅极氧化物晶体管性能分析

Priyanka Saha, S. Sarkhel, Pritha Banerjee, S. Sarkar
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引用次数: 7

摘要

本文旨在建立一种基于物理的三维分析模型,对新提出的具有SiO2/HfO2堆叠栅极氧化物的双材料三重栅极(DMTG)无硅(SON) TFET的电位分布和电场分布进行建模,以获得栅极材料和介电工程技术的双重优势。在导出电场的基础上,利用凯恩隧穿模型计算漏极电流。对现有结构进行了全面的性能比较分析,以确定该模型在表面电位、电场、ON电流和双极传导方面的功能效率优于等效的SMTG。用3DATLAS器件模拟器数据验证了所得到的分析结果,证实了所推导模型的准确性。
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3D Modeling based Performance Analysis of Gate Engineered Trigate SON TFET with SiO2/HfO2 stacked gate oxide
This paper aims to develop a physics based 3Danalytical modeling of potential prof ile and electric field distribution of a newly proposed dual material trigate (DMTG) Silicon On Nothing (SON) TFET with SiO2/HfO2 stacked gate oxide to reap the dual benefits of gate material and dielectric engineering techniques. Based on the derived electric field, drain current is obtained using Kane’s tunneling model. An overall comparative performance analysis of the present structure is done to establish the functional efficiency of the model over its SMTG equivalent in terms of surface potential, electric field, ON current and ambipolar conduction. The analytical results obtained are verified with 3DATLAS device simulator data to substantiate the accuracy of the derived model.
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