多指MOSFET低噪声放大器性能分析

Xiaomeng Zhang, Shuo Li, Tylor Moody, H. Xue, S. Ren
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引用次数: 7

摘要

由于与单指布局相比,多指布局技术提高了电路的性能,因此在纳米级CMOS电路设计中得到了广泛的应用。然而,选择手指宽度和手指数量来优化电路性能是一个具有挑战性的问题。本文分析了采用90nm CMOS技术的固定晶体管总宽度的2.4GHz单端低噪声放大器(LNA)的性能与指数(Nf)的关系。结果表明,漏源电流(Ids)、跨导(gm)和有效栅极电容(Cgeff)随Nf的增大而增大。给出了Nf对晶体管截止频率(fT)、LNA噪声系数(Nf)、电压增益(AV)、中心频率(fC)和阻抗/噪声匹配的影响。
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Multi-finger MOSFET low noise amplifier performance analysis
The Multi-finger layout technique has been extensively used in Nano-scale CMOS circuit design due to the increased circuit performance compared to a single finger layout. However choosing a finger width and number of fingers to optimize circuit performance is a challenging problem. In this paper the performance of a 2.4GHz single ended low noise amplifier (LNA) with a fixed total transistor width in 90nm CMOS technology is analyzed as function of number of fingers (Nf). The results show that the drain to source current (Ids), transconductance (gm) and effective gate capacitance (Cgeff) increase with increasing Nf. The effect of Nf on transistor cutoff frequency (fT) and LNA noise figure (NF), voltage gain (AV), center frequency (fC), and impedance/noise matching is presented.
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