表面陷阱对GaAs mesfet漏极电流频散影响的建模与抑制

Y. Kohno, H. Matsubayashi, M. Komaru, H. Takano, O. Ishihara, S. Mitsui
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引用次数: 27

摘要

研究了GaAs mesfet中的漏极电流频散(门滞后),提出了一种新的表面陷阱模型,揭示了门滞后的机理。假设两种表面陷阱的延迟时间分别为28 msec和5 msec,拟合曲线与测量的漏极电流瞬态吻合。还观察到门滞后与各种工作偏置条件(如脉冲周期、外加脉冲电压和漏极偏置)的关系。此外,还证实了内凹槽深度为500 /spl / Aring/的双凹槽结构可用于减小门滞后。
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Modeling and suppression of the surface trap effect on drain current frequency dispersions in GaAs MESFETs
Drain current frequency dispersions (gate-lag) in GaAs MESFETs have been investigated and a novel surface trap model is proposed which reveals the mechanism of gate-lag. Assuming two kinds of surface traps with a delay time of 28 msec and 5 msec, the fitting curve agrees with the measured drain current transients. The dependence of gate-lag on various operating bias conditions such as pulse period, applied pulse voltage, and drain bias has been also observed. Furthermore, it is confirmed that the double recessed structure with the inner recess depth of 500 /spl Aring/ is available for the reduction of gate-lag.
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