近红外石墨烯/4H-SiC肖特基光电探测器

E. D. Mallemace, T. Crisci, F. D. Corte, S. Rao, M. Casalino
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摘要

碳化硅(SiC)以其优越的电子性能,被公认为新一代光电器件最有前途的候选者之一。本文对工作在近红外(NIR)光谱范围内的石墨烯/4H-SiC肖特基结光电二极管进行了初步研究。特别地,我们报告了据我们所知的第一个石墨烯/ 4h - sic基肖特基近红外光电探测器的制造和电光特性。对具有相同几何形状的10个器件进行了电性表征,I-V图显示出良好的整流行为,串联电阻为60±23 Ω,理想因子为7±1,零偏肖特基势垒高度为0.55±0.05 eV。在光学表征方面,在λ=785 nm的波长处进行,该波长远离所使用的宽禁带半导体的吸收边缘。无偏置电压时的最大内部响应度为0.12 mA/W。即使测量到的响应率仍然有限,我们相信该装置可以为基于石墨烯/4H-SiC结的近红外肖特基光电探测器的研究铺平道路,该探测器可用于普通光纤波长的通信。
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Near-Infrared Graphene/4H-SiC Schottky Photodetectors
Silicon Carbide (SiC), with its superior electronic properties, is recognized as one of the most promising candidates for the new generation of optoelectronic devices. In the present work, a preliminary study about a graphene/4H-SiC Schottky junction photodiode operating in the near-infrared (NIR) spectral range was performed. In particular, we report about the fabrication and the electro-optical characterization of the first - to the best of our knowledge - graphene/4H-SiC-based Schottky near-infrared photodetector. Ten devices, with the same geometry, were electrically characterized, the I-V plot shows a good rectifying behavior, with a series resistance of 60±23 Ω, an ideality factor of 7±1, and a zero-bias Schottky barrier height of 0.55±0.05 eV. Concerning the optical characterization, it was performed at the wavelength of λ=785 nm, which is far away from the absorption edge of the used wide bandgap semiconductor. The maximum internal responsivity without bias-voltage was evaluated as 0.12 mA/W. Even if the measured responsivity is still limited, we believe that this device can pave the way to investigations on near-infrared Schottky photodetectors based on graphene/4H-SiC junctions, useful for communications at the common fiber optic wavelengths.
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