S. Juodkazis, L. Rosa, G. Gervinskas, E. Brasselet
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Tailoring plasmonic field enhancement in spatial and spectral domains
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.
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