相干扫描傅立叶散射法测量不对称侧壁角

M. L. Gödecke, S. Peterhänsel, K. Frenner, W. Osten
{"title":"相干扫描傅立叶散射法测量不对称侧壁角","authors":"M. L. Gödecke, S. Peterhänsel, K. Frenner, W. Osten","doi":"10.1117/12.2218824","DOIUrl":null,"url":null,"abstract":"We propose a measurement technique which enables the precise determination of side wall angles (SWAs) with absolute values below 1°. Our simulations show that a differentiation between asymmetric SWAs is also possible. The grating structure under investigation has a grating period on the order of a few micrometers. Each grating line consists of a fine sub-grating with 40 nm period and 20 nm critical dimension. Our approach is based on coherent high-NA Fourier scatterometry, extended by a lateral scan over the sample. Additionally, a 180°-shearing element allows for coherent superposition of the higher diffraction orders.","PeriodicalId":193904,"journal":{"name":"SPIE Advanced Lithography","volume":"144 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry\",\"authors\":\"M. L. Gödecke, S. Peterhänsel, K. Frenner, W. Osten\",\"doi\":\"10.1117/12.2218824\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a measurement technique which enables the precise determination of side wall angles (SWAs) with absolute values below 1°. Our simulations show that a differentiation between asymmetric SWAs is also possible. The grating structure under investigation has a grating period on the order of a few micrometers. Each grating line consists of a fine sub-grating with 40 nm period and 20 nm critical dimension. Our approach is based on coherent high-NA Fourier scatterometry, extended by a lateral scan over the sample. Additionally, a 180°-shearing element allows for coherent superposition of the higher diffraction orders.\",\"PeriodicalId\":193904,\"journal\":{\"name\":\"SPIE Advanced Lithography\",\"volume\":\"144 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SPIE Advanced Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2218824\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Advanced Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2218824","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

我们提出了一种测量技术,可以精确测定绝对值低于1°的侧壁角(SWAs)。我们的模拟表明,不对称SWAs之间的区分也是可能的。所研究的光栅结构具有几微米量级的光栅周期。每条光栅线由一个周期为40 nm、临界尺寸为20 nm的精细子光栅组成。我们的方法是基于相干高na傅立叶散射测量法,通过对样品进行横向扫描来扩展。此外,180°剪切元件允许高衍射阶的相干叠加。
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Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry
We propose a measurement technique which enables the precise determination of side wall angles (SWAs) with absolute values below 1°. Our simulations show that a differentiation between asymmetric SWAs is also possible. The grating structure under investigation has a grating period on the order of a few micrometers. Each grating line consists of a fine sub-grating with 40 nm period and 20 nm critical dimension. Our approach is based on coherent high-NA Fourier scatterometry, extended by a lateral scan over the sample. Additionally, a 180°-shearing element allows for coherent superposition of the higher diffraction orders.
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