槽边缺陷对磁头/磁带间距的影响

IEEE International Magnetics Conference Pub Date : 1999-05-18 DOI:10.1109/INTMAG.1999.837588

B. Garrettson, S. Tan, A. Lakshmikumaran, F. Talke

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引用次数: 4

摘要

研究了单、双模块磁头槽边缺陷对磁头/磁带接口性能的影响。在实际头部的玻璃复制品上人工制造了一些典型的边缘缺陷，并使用三波长干涉测量法研究了这些缺陷引起的间距变化。结果表明，头部边缘缺陷对胶带的飞行行为影响较小，且影响局限于直接缺陷区域。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Effect of slot edge defects on the head/tape spacing

The effect of slot edge defects on the performance of the head/tape interface is studied for single and double module heads. A number of typical edge defects was created artificially on a glass replica of an actual head, and three-wavelength interferometry was used to study spacing changes caused by these defects. The results show that head edge defects have a small influence on the flying behavior of tape with the effects being localized to the immediate defect area.

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IEEE International Magnetics Conference

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