高机电耦合硅基单晶AlGaN体声波谐振器

J. Shealy, M. D. Hodge, P. Patel, R. Vetury, Alexander Feldman, S. Gibb, Mark D. Boomgarden, Michael P. Lewis, J. Shealy, J. Shealy
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引用次数: 12

摘要

报道了采用单晶AlGaN压电薄膜的体声波谐振器。采用金属有机化学气相沉积法(MOCVD)生长,在直径为150 mm的硅衬底上获得了单晶AlGaN薄膜,(0002)XRD摇摆曲线FWHM为0.37°。制作了12个串联配置的Ω BAW谐振器,谐振频率为2.302GHz,插入损耗为0.29dB,机电耦合为4.44%。最大谐振器Qmax为1277,导致品质系数(FOM)为57。卸载声学Qr为4243,导致FOM为188。这些FOM是迄今为止报道的基于mocvd的单晶谐振器的最高FOM。
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Single crystal AlGaN bulk acoustic wave resonators on silicon substrates with high electromechanical coupling
Bulk acoustic wave (BAW) resonators using single crystal AlGaN piezoelectric films are reported. Metal-organic chemical vapor deposition (MOCVD) growth was used to obtain single crystal AlGaN films on 150-mm diameter <;111> silicon substrates with (0002) XRD rocking curve FWHM of 0.37°. Series-configured 12 Ω BAW resonators with resonant frequency of 2.302GHz were fabricated with insertion loss of 0.29dB and an electromechanical coupling of 4.44%. Maximum resonator Qmax was 1277, leading to a figure of merit (FOM) of 57. Unloaded acoustic Qr was 4243, leading to a FOM of 188. These FOM are the highest reported to date for MOCVD-based single crystal resonators.
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