Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada
{"title":"阻抗匹配控制分析","authors":"Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada","doi":"10.1109/IPEMC.2009.5157563","DOIUrl":null,"url":null,"abstract":"This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.","PeriodicalId":375971,"journal":{"name":"2009 IEEE 6th International Power Electronics and Motion Control Conference","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Analysis of impedance matching control\",\"authors\":\"Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada\",\"doi\":\"10.1109/IPEMC.2009.5157563\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.\",\"PeriodicalId\":375971,\"journal\":{\"name\":\"2009 IEEE 6th International Power Electronics and Motion Control Conference\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-05-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE 6th International Power Electronics and Motion Control Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPEMC.2009.5157563\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE 6th International Power Electronics and Motion Control Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPEMC.2009.5157563","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.
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